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EM sample preparation
We comprehensively consider performance parameters, user experience, pricing, product reliability, and process scalability among other dimensions, aiming to provide a Best Known Method (BKM) solution in the respective scenario, making EM specimen preparation simpler and worry-free.
SEM Series
Filament SEM Scenario
FE-SEM Scenario
Ultra-high Resolution FE-SEM Scenario
MINI Sputter Coater
  • Magnetron sputtering cathode technology: fine deposition without thermal damage
  • Touch screen automatic control: convenient and time-saving to use
  • Digital rotary-tilting sample stage: 3D sample deposition
J20 Dual Target Sputter Coater
  • Dual-target magnetron sputtering cathode: no need to change targets, a unique layered process.
  • Touch screen automatic control: convenient and time-saving to use.
  • Digital rotary-tilting sample stage: 3D sample deposition
ISC150 Sputter Coater
  • Magnetron sputtering cathode technology: Fine coating without thermal damage
  • Large chamber (diameter 150mm), constant pressure sputtering
  • Digital rotary-tilting sample stage: 3D sample deposition
RPS50EM Remote Plasma Source
  • ICP-RF technology, gentler plasma
  • Low thermal damage, low plasma bombardment damage
  • Fully automatic touch screen control, easy to operate
J20 Dual Target Sputter Coater
  • Dual-target magnetron sputtering cathode: no need to change targets, a unique layered process.
  • Touch screen automatic control: convenient and time-saving to use.
  • Digital rotary-tilting sample stage: 3D sample deposition
ISC 150T HV Sputter Coater
  • High vacuum: finer coating
  • Compact, oil-free for cleanliness
  • Digital rotary-tilting sample stage: 3D sample deposition
RPS50EM Remote Plasma Source
  • ICP-RF technology, gentler plasma
  • Low thermal damage, low plasma bombardment damage
  • Fully automatic touch screen control, easy to operate
TEM Series
AC-TEM Scenario
200KV FE-TEM Scenario
120KV TEM / CRYO-TEM Scenario
SPC150 HV Plasma Cleaner
  • Ultrathin carbon film hydrocarbon contamination cleaning
  • TEM sample/sample holder plasma treatment
  • Specialized silicon contamination cleaning
THS 05T TEM Holder Storage Station
  • 5 independent storage stations with no interference in vacuum retention
  • Automatic pressure maintenance to ensure constant vacuum degree
  • High-vacuum heating and degassing of TEM cryogenic holders
IC150 Plasma Cleaner
  • TEM sample and holder cleaning
  • Grid/sample surface hydrophilization treatment
  • High-performance vacuum dry pump, oil-free and efficient
THS 05 TEM Holder Storage Station
  • 5 independent storage stations with no interference in vacuum retention
  • Automatic pressure maintenance to ensure constant vacuum
  • Fast speed, cost-effective, and compact structure.
COOLGLOW Glow Discharge
  • ICP-RF technology: room temperature treatment without damage
  • Good uniformity and repeatability
  • Convenient operation
EM sample preparation
Film measurement
Film Preparation
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