RPS50EM Remote Plasma Source

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EM sample preparation

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MINI Sputter Coater

J20 Dual Target Sputter Coater

J20 Dual Target Sputter Coater

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RPS50EM Remote Plasma Source

RPS50EM Remote Plasma Source

TEM Series

SPC150 HV Plasma Cleaner

IC150 Plasma Cleaner

COOLGLOW Glow Discharge

THS 05 TEM Holder Storage Station

THS 05T TEM Holder Storage Station
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Semiconductor thin film measurement

FST 5000 Film Stress Tester

FST 6000 Online Thin Film Stress Tester

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DSC3000 Magnetron Sputter Coater

DSC2000 Magnetron Sputter Coater
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Electron microscope chamber cleaning / Routine cleaning of the pre-evacuation chamber

1ICP-RF technology, gentler plasma

2 Low thermal damage, low plasma bombardment damage

3 Fully automatic touch screen control, easy to operate

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Product Introduction

The RPS50EM is a remote plasma cleaning source that can be integrated into SEM or FIB chambers. It efficiently cleans hydrocarbon contaminants from the chamber and samples by generating plasma through gas ionization. This not only resolves the carbon deposition black frame phenomenon during imaging but also improves imaging resolution and contrast, and shortens the chamber evacuation time.

RF-ICP technology makes the plasma gentler, significantly reducing thermal damage and plasma bombardment damage during the cleaning process.

Product Specification

Technical Specifications	Parameters
Working Pressure	0.5-40Pa
RF power supply	13.56 MHz RF power supply, RF power adjustable from 10 to 50 W
Gas Module	Standard MFC 100 sccm flow meter (N₂) / 1 unit
Operation Mode	Touchscreen Control with the Control System Providing Interlock Protection Functions. It Provides Serial Control Commands for Further Development and Programming
Dimension	250mm350mm110 mm（Controller） 178.5mm138.5mm99.5mm（RF Ion Source）
Weight	~9kg
Connection Method	KF40 Flange Interface
Gas Inlet	Ø6mm Gas Pipe
Power Supply	100-220V AC, 50/60Hz Grounded Three-prong Plug
Power Consumption	＜200 W
Warranty	One Year