EN
IC150 Plasma Cleaner
TEM sample/holder cleaning and hydrophilization treatment
1TEM sample and holder cleaning
2 Grid/sample surface hydrophilization treatment
3 High-performance vacuum dry pump, oil-free and efficient
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Product Introduction

If TEM sample holders or samples are exposed to air or improperly stored, organic contamination can occur. Placing them in the TEM chamber can not only affect imaging quality but also contaminate the TEM chamber itself.

The IC150 plasma cleaner uses an RF power supply to ionize the incoming air, producing strong oxidative particles such as oxygen radicals, ozone, and oxygen plasma. These particles chemically react with organic contaminants on the sample surface, converting them into CO2 and H2O, which are then removed by the vacuum pump system. This process effectively cleans organic contaminants from the sample holder or sample surface.

Product Specification

Technical Specifications

Parameters

Vacuum Pump

Oil-free Diaphragm Pump

Pumping Speed

>0.7m3/h

Ultimate Vacuum

<50Pa

Working Pressure

60-150Pa

Pumping Down Time

<2Min

Vacuum Gauge

Pirani gauge

Chamber

~Ø150*90mm Stainless Steel Chamber

RF Power Supply

Adjustable from 10 to 50 W, 13.56 MHz

Operating Method

Touchscreen Control with the Control System Providing Interlock Protection Functions

Weight

~20 kg

Dimension

~400mm*310mm*368mm

Power Supply

100-220V AC, 50/60Hz Grounded Three-prong Plug

Power Consuption

< 300 W

Warranty

One year