
The S20 is a high-vacuum dual-target ion sputter coater based on magnetron sputtering technology. It integrates a turbo molecular pump and an oil-free diaphragm pump to provide an ultra-clean high-vacuum environment (<5×10⁻² Pa). Featuring a coordinated design of tilted dual-target and rotary sample stage, it deposits uniform and stable conductive coatings on sample surfaces. The system is widely suitable for (ultra-)high-resolution FE-SEM sample preparation, particularly for 3D powder samples and delicate specimens. Available sputtering materials include Au, Pt, Pd, Ir as well as Pt-Au and Pt-Pd layered alloys, etc.
Touchscreen automatic control, plug and play.
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Technical Specifications |
Application Scenarios |
Conductive Coating Preparation for HR/UHR FE-SEM Samples |
Vacuum Pump |
Turbo Molecular Pump + Oil-Free Diaphragm Pump |
Pumping Speed |
≥Diaphragm Pump 0.7 m3/h +Molecular Pump 30.5 m3/h |
Ultimate Vacuum |
< 5×10-2 Pa |
Working Pressure |
0.5-2Pa |
Gas Control |
Constant gas control,MFC Control(50 SCCM N2) |
Pumping Down Time |
<3-5Min |
Sputtering Timer |
0-300S |
Vacuum Gauge |
High-Vacuum Composite Vacuum Gauge 【Atmospheric Pressure to 10-3 Pa Range】 |
Chamber Dimension |
~Ø150×120mm |
Rotary Sample Stage |
Diameter: 80mm; Rotation Speed: 60RPM; TSD: 55-70mm continuously adjustable |
Sputtering Target |
Ø30×0.2-1mm/2pcs, Single-Target sputtering and Dual-Target Sequential sputtering |
Sputtering Power |
Constant power magnetron sputtering DC power supply Max. 30W,Max. 100mA, 0-800V DC |
Gas Inlet |
Ø6mm Air tube |
Operating Mode |
Touchscreen control,The control system provides interlock protection function |
Weight |
~15kg |
Dimension |
~250mm W×360mm D×374mm H |
Power Supply |
100-240V AC, 180W Max. |
Warranty |
1 Year |
Remarks |
The technical specifications and parameters listed above will be updated without prior notice. If you have any questions, please contact us. |