The SPC150 is a high-vacuum plasma cleaner equipped with three gas lines controlled by MFCs for precise gas flow regulation. A grid between the ion source and the sample chamber provides gentler cleaning, making it particularly suitable for cleaning hydrocarbon and silicon contamination on ultrathin carbon films and other samples.
The SPC also enables in-situ plasma treatment of TEM sample holders or Cell chips, as well as in-situ vacuum leak detection for TEM sample holders.
|
Technical Specification |
Parameters |
|
Vacuum Pump System |
Turbo Pump and Oil-free Diaphragm Pump |
|
Turbo Pump Inlet Flange |
DN63ISO-K (Standard) |
|
Turbo pump speed |
>85L/s (N2) |
|
diaphragm pump speed |
>0.7m3/h |
|
Ultimate vacuum |
<5E-4Pa |
|
Pump System Start-up Time |
≤300s |
|
TEM Holder Accessories |
Compatible with Thermo, JEOL, Hitachi sample holders; supports 2 or more TEM holders |
|
Chamber Dimension |
~160*100 mm |
|
Plasma Cleaning Source |
The Principle of Remote RF Source, Manual Matching |
|
Power Supply |
13.56MHz RF power, adjustable from 5W to 50W |
|
Gas Control |
3-way MFC control, and can be connected to gases like Ar, O2, and H2 |
|
Vacuum Gauge |
Full-range Compound Gauge |
|
Operating method |
Touchscreen Control with the Control System Providing Interlock Protection Functions |
|
Weight |
~30Kg |
|
Dimensions |
~500mm * 466mm * 390mm |
|
Power Supply |
100-220V AC, 50/60Hz Grounding Triangle Plug |
|
Power Consumption |
<500W |
|
Warranty |
One year |
EN
Message consultation
Appointment for trial
Product Introduction
