
|
Technical Specifications |
Application Scenarios |
Conductive Coating Preparation for HR/UHR FE-SEM Samples |
Vacuum Pump |
Rotary Vane Pump |
Pumping Speed |
≥4m3/h |
Ultimate Vacuum |
<1Pa |
Working Pressure |
4-10Pa |
Pumping Down Time |
<2-3Min |
Sputtering Timer |
0-300S |
Vacuum Gauge |
Pirani Vacuum Gauge |
Chamber Dimension |
~Ø150×120mm |
Rotary Sample Stage |
Diameter: 80mm; Rotation Speed: 60RPM; TSD: 55-70mm continuously adjustable |
Sputtering Target |
Ø30×0.2-1mm/2pcs, Single-Target sputtering and Dual-Target Sequential sputtering |
Sputtering Power |
Constant Power Magnetron Sputtering DC Power Supply ( Max.30W, Max.100 mA, 0-800V DC ) |
Operation Mode |
Touchscreen control, the control system provides interlock protection function |
Weight |
Main Unit~15kg |
Dimension |
~250mm W×360mm D×374mm H |
Power Supply |
100-240V AC, 50/60Hz Grounded Three-prong Plug |
Power Consumption |
<500W |
Warranty |
1 Year |
Remarks |
The technical specifications and parameters listed above will be updated without prior notice. If you have any questions, please contact us. |
Under the same sputtering conditions, gold (Au) exhibits a significant charge elimination effect, but the Au particles are clearly visible. Platinum (Pt) does not eliminate charge, and in Pt-Au layered samples, there is neither charge nor clear visibility of metal particles.
For 3D sample scenarios (powder, porous, fibers, etc., analogous to mountain roads): The J20 tilt angle dual cathode, rotation deflection and layering process achieves comprehensive multi-angle large-area deposition, with better charge and image effects than single-target Pt sputtering.