The S300 is a high-vacuum ion sputtering system based on magnetron sputtering. It uses a turbomolecular pump and oil-free diaphragm pump to achieve a clean vacuum of 10^-4 Pa. With its rotating sample stage, it can uniformly coat conductive films on up to 12-inch wafers using a small 2-inch cathode, reducing the cost of noble metal targets. Ideal for preparing samples for FESEM, it supports sputtering gold, platinum, and other reactive metals. The system is user-friendly with touch screen control and plug-and-play functionality.